Paper
8 March 1996 Fabrication of microlens arrays by reactive ion milling
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Abstract
Fabrication of refractive microlens arrays on several infrared (IR) transmissive materials was studied. The fabrication process consists of forming photoresist microlenses by thermal reflow of photoresist islands, and transferring this pattern into the IR substrate by ion milling. Microlens arrays having a wide range of F-numbers (F/0.3 - F/12) and sizes were fabricated using a modified ion milling process, where background oxygen and ion energy were used to control the photoresist and substrate erosion rates, respectively. This approach enabled a large range of milling selectivity (e.g. 0.6 - 12 for CdTe) and hence accurate control of lens sag heights. This is important since photoresist microlenses can be successfully fabricated only within a limited range of F-numbers. The etch selectivity also enabled fabrication of nonspherical shapes, starting from spherical photoresist preforms, by judicious control of sputter selectivity during the milling process. Microlens arrays were fabricated in several IR materials, including CdTe, ZnS, Ge, Si, GaAs, InP, GaP and Al2O3. Among these materials GaP and ZnS are also attractive visible and near IR wavelength microlens materials, where their high refractive index results in much lower sag heights than quartz lenses of comparable F-number.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haluk O. Sankur, Randolph L. Hall, M. Edward Motamedi, William J. Gunning III, and William E. Tennant "Fabrication of microlens arrays by reactive ion milling", Proc. SPIE 2687, Miniaturized Systems with Micro-Optics and Micromechanics, (8 March 1996); https://doi.org/10.1117/12.234628
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Cited by 4 scholarly publications.
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KEYWORDS
Ions

Photoresist materials

Microlens

Microlens array

Oxygen

Argon

Infrared materials

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