Relationships between process fundamentals, facility design, and production control of semiconductor manufacturing systems

Shannon Chen; Rieko C. Hase; Kaine Mordaunt; Reha M. Uzsoy; Christos G. Takoudis

doi:10.1117/12.221317

19 September 1995 Relationships between process fundamentals, facility design, and production control of semiconductor manufacturing systems

Shannon Chen, Rieko C. Hase, Kaine Mordaunt, Reha M. Uzsoy, Christos G. Takoudis

Author Affiliations +

Proceedings Volume 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing; (1995) https://doi.org/10.1117/12.221317
Event: Microelectronic Manufacturing '95, 1995, Austin, TX, United States

Abstract

Basic interrelationships among yields, processing environments, and shop-floor scheduling in semiconductor wafer fabrication facilities are currently under study. In this paper, we focus on a hypothetical wafer fabrication facility producing 3D CMOS devices designed and developed at Purdue. A key step of this sequence of this process is silicon selective epitaxial growth (SEG). Our emphasis is on the effects of substrate temperature, and system pressure on the quality of the films grown through silicon SEG. Such studies result in relationships between yield and processing conditions. For example, higher substrate temperatures, in the range of 800 to 1000 degree(s)C studied, appear to result in significantly lower defect densities for all sizes of seed windows investigated. Our experimental observations on relationships between yield and time can in turn can be used to examine the viability of different layouts for wafer fabrication facilities. We focus on cellular layouts, where machines are organized into cells, each dedicated to the processing of a certain subset of operations. For the 3D CMOS fab mentioned previously, we present results of simulation experiments that indicate that under certain conditions, cellular layouts result in better cycle time performance at the expense of some additional capital investment.

Citation Download Citation

Shannon Chen, Rieko C. Hase, Kaine Mordaunt, Reha M. Uzsoy, and Christos G. Takoudis "Relationships between process fundamentals, facility design, and production control of semiconductor manufacturing systems", Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); https://doi.org/10.1117/12.221317

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available