Paper
19 September 1995 Evaluation of ULPA/prefilter media for the reduction of airborne boron contamination
John Squatrito, Raul Nanez Jr., Dewey Keeton
Author Affiliations +
Abstract
An investigation was conducted to evaluate various combinations of filter media to minimize boron contamination in clean room environments. Three (mu) PVC fan/blower test chamber modules were constructed, each with a different filter media and placed in a clean room environment. The various media tested included a standard Ultra Low Penetration Air (ULPA), an expanded polytetrafluoroethylene (PTFE) ULPA, and a combination of PTFE with a chemically active prefilter (carbon based). An encapsulation procedure was used to trap airborne contamination on the exposed area of a wafer and sandwich contaminants. The sandwiched contaminants at these controlled interfaces are tested for boron contamination levels. Secondary Ion Mass Spectroscopy (SIMS) was used to determine boron contamination levels at each controlled interface. Results from these experiments were used to quantify the effectiveness of different types of ULPA filters on airborne boron contaminants.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Squatrito, Raul Nanez Jr., and Dewey Keeton "Evaluation of ULPA/prefilter media for the reduction of airborne boron contamination", Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); https://doi.org/10.1117/12.221313
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KEYWORDS
Boron

Contamination

Semiconducting wafers

Interfaces

Particles

Carbon

Borosilicate glass

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