Photomask production integration of KLA STARlight 300 system

Franklin D. Kalk; David Mentzer; Anthony Vacca

doi:10.1117/12.228162

8 December 1995 Photomask production integration of KLA STARlight 300 system

Franklin D. Kalk, David Mentzer, Anthony Vacca

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228162
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

This paper describes the use of the KLA STARlight^TM 300 inspection system for advanced photomask manufacturing and development. STARlight's combination of state-of- the-art defect detectivity and high speed helps to streamline final mask inspection and improve product quality. For advanced development, previously undetected defects can now be identified, their effects on printability can be quantified, and strategies to eliminate them can be implemented.

Citation Download Citation

Franklin D. Kalk, David Mentzer, and Anthony Vacca "Photomask production integration of KLA STARlight 300 system", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228162

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