Novel techniques on photomask blanks enhancement for the laser reticle writer

Hideo Kobayashi; Keishi Asakawa; Yasunori Yokoya

doi:10.1117/12.228217

8 December 1995 Novel techniques on photomask blanks enhancement for the laser reticle writer

Hideo Kobayashi, Keishi Asakawa, Yasunori Yokoya

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228217
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

The laser writer (CORE, ALTA) has come to the front for advanced reticle fabrication, so that photomask blanks enhancement is much more to be desired for the application. We have aimed at a resist to accomplish the blanks enhancement by studying soft-baking conditions as the overall performance of a resist could be significantly affected by the baking conditions. During the study, we developed and established a novel technique to observe a resist behavior to the baking conditions, which is called DRAUGHT: 'dissolution rate analysis in unexposed area to gain the highest tone of a resist.' The study also resulted in a suggestion of indispensability of another novel technique called CPQ: 'chilled plate quench' to obtain superior CD uniformity with a resist on the leading edge 6025 blanks. By employing DRAUGHT and CPQ, an optimization and enhancement of photomask blanks was carried out, and the potential of a resist was fully brought out under the optimal baking condition probed out by the novel techniques. This paper describes details of our findings on the novel techniques of DRAUGHT and CPQ, results of photomask blanks enhancement, and an initial evaluation result of new resist candidates for the laser reticle writer.

Citation Download Citation

Hideo Kobayashi, Keishi Asakawa, and Yasunori Yokoya "Novel techniques on photomask blanks enhancement for the laser reticle writer", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228217

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
17 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Coating

Reticles

Photomasks

Reflectivity

Critical dimension metrology

Chromium

Manufacturing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years