Investigation of glass polycapillaries for use in proximity x-ray lithography

Ira Klotzko; Qi-Fan Xiao; David M. Gibson; Robert Gregory Downing; Walter M. Gibson; Andrei A. Karnaukhov; Chris J. Jezewski

doi:10.1117/12.220993

18 September 1995 Investigation of glass polycapillaries for use in proximity x-ray lithography

Ira Klotzko, Qi-Fan Xiao, David M. Gibson, Robert Gregory Downing, Walter M. Gibson, Andrei A. Karnaukhov, Chris J. Jezewski

Author Affiliations +

Proceedings Volume 2523, Applications of Laser Plasma Radiation II; (1995) https://doi.org/10.1117/12.220993
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Achieving the goals set by the US National Semiconductor Roadmap requires that sub 0.18 micrometers design rules be incorporated into semiconductor device structures by the year 2001. A promising approach makes use of shorter wavelength radiation than is presently used in lithography, namely x-rays. Arrays of glass fibers have the potential of controlling parameters important to point-source lithogrpahy including local divergence, global divergence, and field uniformity. The high absorption rate and scattering of x-rays in air at energies less than 3 keV necessitates that experiments must be conducted in an evacuated environment. Consequently, there has been little research on the transmission of x-rays through glass polycapillary fibers at energies of 3 keV and lower. An experimental setup to test capillaries under such conditions has been developed at XOS. It has sufficiently long optical paths in the vacuum chamber to be useful in evaluating the parameters critical for semiconductor lithography. Experimental and simulated transmission characteristics of polycapillary fibers as well as a discussion on the feasibility of using them in a collimator for x-ray lithography are presented in this paper.

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Ira Klotzko, Qi-Fan Xiao, David M. Gibson, Robert Gregory Downing, Walter M. Gibson, Andrei A. Karnaukhov, and Chris J. Jezewski "Investigation of glass polycapillaries for use in proximity x-ray lithography", Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); https://doi.org/10.1117/12.220993

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