Igor V. Kozhevnikov,1 L. L. Balakireva,1 Anatoli I. Fedorenko,2 I. A. Kopealets,2 Vladimir E. Levashov,1 A. N. Stetsenko,2 I. I. Struk,1 Alexander V. Vinogradov1
1P.N. Lebedev Physical Institute (Russia) 2Kharkov Polytechnic Univ. (Ukraine)
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Flat and spherical Os - Si multilayer mirrors were synthesized and studied. Measured normal incidence reflectivity was 20% at the wavelength lambda equals 380 angstrom. The effect of impurities in silicon layers on the multilayer reflectivity in the ultrasoft x-ray region is discussed.
Igor V. Kozhevnikov,L. L. Balakireva,Anatoli I. Fedorenko,I. A. Kopealets,Vladimir E. Levashov,A. N. Stetsenko,I. I. Struk, andAlexander V. Vinogradov
"Synthesis and measurement of Os-Si multilayer mirrors optimized for the wavelength 380 Å", Proc. SPIE 2520, Soft X-Ray Lasers and Applications, (25 September 1995); https://doi.org/10.1117/12.221637
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Igor V. Kozhevnikov, L. L. Balakireva, Anatoli I. Fedorenko, I. A. Kopealets, Vladimir E. Levashov, A. N. Stetsenko, I. I. Struk, Alexander V. Vinogradov, "Synthesis and measurement of Os-Si multilayer mirrors optimized for the wavelength 380 A," Proc. SPIE 2520, Soft X-Ray Lasers and Applications, (25 September 1995); https://doi.org/10.1117/12.221637