Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)

Cheng-Hao Ko; Janos Kirz; Klaus Maier; Barry L. Winn; Harald Ade; Steven L. Hulbert; Erik D. Johnson; Erik H. Anderson

doi:10.1117/12.221668

25 September 1995 Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)

Cheng-Hao Ko, Janos Kirz, Klaus Maier, Barry L. Winn, Harald Ade, Steven L. Hulbert, Erik D. Johnson, Erik H. Anderson

Author Affiliations +

Proceedings Volume 2516, X-Ray Microbeam Technology and Applications; (1995) https://doi.org/10.1117/12.221668
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The second generation scanning photoelectron microscope at beamline X1A of the National Synchrotron Light Source (X1A SPEM-II) is designed for spatially resolved elemental and chemical analysis by x ray photoelectron spectroscopy (XPS) on material surfaces. This microscope can focus photon energies between 300 to 800 eV with submicron spatial resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer (HSA) with multi-channel detection (MCD), which enables a technique called 'parallel imaging for chemical state mapping' (PICSM). The PICSM technique was demonstrated using a Si/SiO₂ pattern.

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Cheng-Hao Ko, Janos Kirz, Klaus Maier, Barry L. Winn, Harald Ade, Steven L. Hulbert, Erik D. Johnson, and Erik H. Anderson "Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); https://doi.org/10.1117/12.221668

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