Laser-assisted controlled in-diffusion processes for preparation of optical waveguides and ultrashallow semiconductor junctions

Maria Dinescu; N. Chitica; Adriana Lita; D. Pantelica; B. Bucur; A. Ferrari; Gabriella Maiello; Mario Bertolotti; Galina Michailova; C. Gerardi; Rossella Giorgi; T. Dekonimos-Makris; Marco Montecchi

doi:10.1117/12.203594

8 March 1995 Laser-assisted controlled in-diffusion processes for preparation of optical waveguides and ultrashallow semiconductor junctions

Maria Dinescu, N. Chitica, Adriana Lita, D. Pantelica, B. Bucur, A. Ferrari, Gabriella Maiello, Mario Bertolotti, Galina Michailova, C. Gerardi, Rossella Giorgi, T. Dekonimos-Makris, Marco Montecchi

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Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203594
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania

Abstract

We present new results in the laser doping of two materials of major interest for applications: LiNbO₃ and Si. In both cases a solid dopant source was used. Using a free running ruby laser, we have doped single crystalline lithium niobate with Ti down to 1.5 micrometers . A step- like Ti profile was determined by Rutherford BAckscattering Spectrometry. Irradiating with a cw CO₂ laser Si wafers coated with a P-containing paste, n-p junctions were obtained.

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Maria Dinescu, N. Chitica, Adriana Lita, D. Pantelica, B. Bucur, A. Ferrari, Gabriella Maiello, Mario Bertolotti, Galina Michailova, C. Gerardi, Rossella Giorgi, T. Dekonimos-Makris, and Marco Montecchi "Laser-assisted controlled in-diffusion processes for preparation of optical waveguides and ultrashallow semiconductor junctions", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); https://doi.org/10.1117/12.203594

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