Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation

Michael S. Yeung; Andrew R. Neureuther

doi:10.1117/12.209271

26 May 1995 Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209271
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

This paper discusses a new formulation of the Fast Multipole Method of 3D topography scattering in the physical-optics approximation. The novelty of this formulation lies in the use of generalized Sommerfeld integrals to represent the vector multipole waves. This technique allows 3D reflective-notching simulation to be done on an ordinary workstation in O(N^3/2) time, where N is the number of nodes on the surface of the topography. Simulation results for 3D topography with different slope angles are presented. The simulated reflective-notching effects were found to be consistent with a ray-optics model.

Citation Download Citation

Michael S. Yeung and Andrew R. Neureuther "Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209271

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