Investigation of lithography yield-loss issues from focusing/leveling system of advance stepper

Daniel Hao-Tien Lee; Chia-Jen Cheng; Tah-Te Shih

doi:10.1117/12.209311

26 May 1995 Investigation of lithography yield-loss issues from focusing/leveling system of advance stepper

Daniel Hao-Tien Lee, Chia-Jen Cheng, Tah-Te Shih

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209311
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Three types of dies on the wafer including dies on wafer edge, dies adjacent to testkey patterns, and dies with asymmetric chip layout have been identified for mistilting on the lithography exposure processes. There are several approaches i.e. dummy die exposed on the wafer edge, various focus offset, and pattern layout modification etc. can alleviate this problem. However, to complete solve these issues rely on the fundamental and methodical improvements on the stepper leveling system and control software.

Citation Download Citation

Daniel Hao-Tien Lee, Chia-Jen Cheng, and Tah-Te Shih "Investigation of lithography yield-loss issues from focusing/leveling system of advance stepper", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209311

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