Integrating proximity effect corrections with photomask data preparation

Oberdan W. Otto; Richard C. Henderson

doi:10.1117/12.209251

26 May 1995 Integrating proximity effect corrections with photomask data preparation

Oberdan W. Otto, Richard C. Henderson

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209251
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In an earlier work we demonstrated the feasibility of automated software correction for imaging and process proximity effects by precompensating mask layout data. As correction techniques and algorithms continue to be refined, it is important to deal with integrating the correction computation into the manufacturing data flow. This paper addresses issues such as computational speed, data volumes, management of the data hierarchy, and the need for geometric operations between various CAD layers within the context of a data hierarchy manager.

Citation Download Citation

Oberdan W. Otto and Richard C. Henderson "Integrating proximity effect corrections with photomask data preparation", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209251

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