Fast algorithms for 3D high NA lithography simulation

Qi-De Qian; Francisco A. Leon

doi:10.1117/12.209269

26 May 1995 Fast algorithms for 3D high-NA lithography simulation

Qi-De Qian, Francisco A. Leon

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209269
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Partial coherent imaging in a high NA stepper is treated with the source integration method. Image formation in 3D is accomplished by the propagation and interference of plane waves. This approach allows the extensive use of FFT and leads to efficient computation of the latent image. In order to further reduce the computation time, we propose a sufficient condition for the grid density in an image plane based on the sampling theorem. Finally, we present a semi-analytical method for the modeling of post exposure bake process in 3D. With these enhancements in the algorithm, a typical 3D latent image problem can be solved in a few second on a workstation.

Citation Download Citation

Qi-De Qian and Francisco A. Leon "Fast algorithms for 3D high-NA lithography simulation", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209269

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