Thick film photoresist resolution enhancement with surfactant surface treatment

Dennis R. McKean; Thomas P. Russell; Alfred F. Renaldo

doi:10.1117/12.210365

9 June 1995 Thick film photoresist resolution enhancement with surfactant surface treatment

Dennis R. McKean, Thomas P. Russell, Alfred F. Renaldo

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210365
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A method for thick film photoresist resolution enhancement was investigated which involves treatment of photoresist films with solutions of cationic surfactants prior to development. By utilizing a surfactant surface treatment process, resist contrast is improved and better image resolution can be achieved. The effectiveness of the surfactant treatment is dependent on a number of factors including structure and concentration of surfactant, pH of the solution, mode and duration of treatment, and effect of other additives. The mechanism of the process has been investigated and the results suggest that the critical factors are the attachment of the surfactant to the top surface of the resist and the detachment of surfactant depending on film acid concentration.

Citation Download Citation

Dennis R. McKean, Thomas P. Russell, and Alfred F. Renaldo "Thick film photoresist resolution enhancement with surfactant surface treatment", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210365

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