PROCEEDINGS VOLUME 2437
SPIE'S 1995 SYMPOSIUM ON MICROLITHOGRAPHY | 19-24 FEBRUARY 1995
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
Editor(s): John M. Warlaumont
Editor Affiliations +
IN THIS VOLUME

8 Sessions, 43 Papers, 0 Presentations, 0 Posters
XRL Tooling  (2)
SPIE'S 1995 SYMPOSIUM ON MICROLITHOGRAPHY
19-24 February 1995
Santa Clara, CA, United States
Process Control in X-Ray Lithography
Lars W. Liebmann, Richard A. Ferguson, Ronald M. Martino, Angela C. Lamberti, J. F. Hart, R. French
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209150
Christine M. Nelson, Scott Daniel Hector, William Chu, Philip A. Seese, Matthew A. Thompson, Victor Pol, Mark A. McCord, James M. Oberschmidt, James Welch Taylor
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209161
Zheng Chen, Azalia A. Krasnoperova, Yueqi Zhu, Franco Cerrina
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209171
Jerry Z.Y. Guo, Anthony E. Novembre, Herschel M. Marchman, Joseph A. Abate, John Frackoviak, David N. Tomes, Allen G. Timko, George K. Celler
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209180
Hiroaki Sumitani, Kenji Itoga, Masami Inoue, Hiroshi Watanabe, Norikazu Yamamoto, Kenji Marumoto, Yasuji Matsui
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209188
Anthony E. Novembre, Regine G. Tarascon-Auriol, Omkaram Nalamasu, Linus A. Fetter, Kevin J. Bolan, Chester S. Knurek, Norbert Muenzel, Heinz E. Holzwarth
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209189
X-Ray Lithography Applications
Ronald DellaGuardia, Chet Wasik, Denise M. Puisto, Robert H. Fair, Lars W. Liebmann, Janet M. Rocque, Steven C. Nash, Angela C. Lamberti, George J. Collini, et al.
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209190
Gee E. Rittenhouse, William M. Mansfield, Avi Kornblit, David N. Tomes, Raymond A. Cirelli, John Frackoviak, George K. Celler
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209191
Dean Morris, Andreas Schmidt, Raul E. Acosta, Massimo Gentili, Romano Maggiora, David E. Andrews
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209192
XRL Tooling
Alek C. Chen, J. P. Silverman
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209154
Takashi Hifumi, Tohru Itoh
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209155
E-Beam Lithogrpahy
James D. Rockrohr, R. Butsch, W. A. Enichen, Michael S. Gordon, Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209156
Mark A. Gesley, Terry Mulera, C. Nurmi, J. Radley, Allan L. Sagle, Keith P. Standiford, Zoilo C. H. Tan, John R. Thomas, Lee Veneklasen
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209157
Hiroya Ohta, Takashi Matsuzaka, Norio Saitou
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209158
Klaus T. Kohlmann-von Platen, L. Schmidt, Wilhelm H. Bruenger
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209159
Ralf Steingrueber, Herbert Engel, R. Loeffler, C. Sakkas
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209160
Christine A. Kondek, Louis C. Poli
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209162
Advanced Mask Fabrication
Diane K. Stewart, Andrew F. Doyle, J. David Casey Jr.
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209163
Masa-aki Kurihara, Minoru Komada, Hisashi Moro-oka, Naoya Hayashi, Hisatake Sano
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209164
Ikuo Okada, Takashi Ohkubo, Yasunao Saitoh, Misao Sekimoto, Tadahito Matsuda
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209165
John W. Herman, Yung-Ho Chuang, Baorui Yang, Minchuan Wang, Stephen P. Palese
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209166
EUV Lithography
Daniel A. Tichenor, Glenn D. Kubiak, Steven J. Haney, Rodney P. Nissen, Kurt W. Berger, Richard William Arling, Avijit K. Ray-Chaudhuri, Khanh B. Nguyen, Richard H. Stulen, et al.
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209167
Gary N. Taylor, Richard S. Hutton, Susan M. Stein, Craig H. Boyce, Obert R. Wood II, Bruno LaFontaine, Alastair A. MacDowell, David R. Wheeler, Glenn D. Kubiak, et al.
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209168
Khanh B. Nguyen, Avijit K. Ray-Chaudhuri, Daniel A. Tichenor, Richard H. Stulen, Rodney P. Nissen, Kurt W. Berger, Phillip H. Paul, Donald M. Tennant, Linus A. Fetter, et al.
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209169
Tanya E. Jewell
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209170
Kenneth A. Goldberg, H. Raul Beguiristain, Jeffrey Bokor, Hector Medecki, Keith H. Jackson, David T. Attwood Jr., Gary E. Sommargren, James P. Spallas, Ralph E. Hostetler
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209172
Poster Session
Liyan Zhang, Emilio Panarella, B. Hilko, Haibo Chen
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209173
Peter A. Hollanda
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209174
Jianguo Zhu, Zheng Cui, Philip D. Prewett
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209175
Kurt R. Kimmel, Alek C. Chen, Lynn A. Powers, Ben R. Vampatella
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209176
Herbert Engel, Joerg Wengelink, Ralf Steingrueber
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209177
Lothar Bauch, Monika Boettcher, Ulrich Haak, Ulrich A. Jagdhold
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209178
Elena Fedorovna Reznikova, Stalina A. Prokhorova, T. V. Basova, B. M. Ajupov, Vladimir P. Naz'mov, I. A. Makarov, Igor K. Igumenov, Jurij H. Krieger
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209179
Vladimir A. Zlobin, V. I. Mamonov, Olga G. Vasiljeva
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209181
Yubin Guo, Futian Li
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209182
Process Control in X-Ray Lithography
Kathleen Early, David Trindade, Quinn J. Leonard, Franco Cerrina, Klaus Simon, Mark A. McCord, Daniel J. DeMay
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209183
Poster Session
Elena Fedorovna Reznikova, Vladimir V. Chesnokov, Galina I. Zharkova, Oleg A. Makarov, Vladimir P. Naz'mov, Igor K. Igumenov
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209184
Advanced Mask Fabrication
William B. Thompson, A. Armstrong, S. Etchin, Raymond Hill, Sigfried Kalbitzer, R. Percival, A. Saxonis, Christoph Wilbertz
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209185
Poster Session
Yuli Vladimirsky, Olga Vladimirsky, Volker Saile, Kevin J. Morris, J. Michael Klopf
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209186
E-Beam Lithogrpahy
Martin C. Peckerar, Christie R. Marrian
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209187
Plenary Session
Gordon E. Moore
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209151
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209152
Proceedings Volume Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (1995) https://doi.org/10.1117/12.209153
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