Paper
14 July 1995 Laser-induced damage in dielectrics with nanosecond to spupicosecond pulses I: experimental
Brent C. Stuart, Steve M. Herman, Michael D. Perry
Author Affiliations +
Abstract
We report extensive laser-induced damage threshold measurements on pure and multilayer dielectrics at 1053 and 526 nm for pulse durations, (tau) , ranging from 140 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated (tau) 1/2 scaling indicate that damage results from plasma formation and ablation for (tau) <EQ10 ps and from conventional melting and boiling for (tau) >50 ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with both the pulsewidth and wavelength scaling experimental results.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brent C. Stuart, Steve M. Herman, and Michael D. Perry "Laser-induced damage in dielectrics with nanosecond to spupicosecond pulses I: experimental", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213772
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Cited by 6 scholarly publications.
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KEYWORDS
Picosecond phenomena

Laser induced damage

Laser damage threshold

Dielectrics

Ionization

Silica

Multilayers

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