Paper
19 June 1995 Low-threshold multiwavelength VCSEL arrays fabricated by nonplanar MOCVD
Fumio Koyama, Toshikazu Mukaihara, Yukio Hayashi, Noriyuki Ohnoki, Nobuaki Hatori, Kenichi Iga
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Abstract
A novel approach of on-wafer wavelength control for vertical cavity surface emitting lasers (VCSELs) is proposed using nonplanar metalorganic chemical vapor deposition. The resonant wavelength of 980nm VCSELs grown on a patterned substrate can be controlled in the wavelength range over 45nm by changing the size of circular patterns. We have fabricated linear and 2D multiwavelength vertical surface emitting laser (VCSEL) arrays fabricated by using this technique. The threshold of multi-wavelength VCSELs formed on the patterned substrate is as low as 3 mA. A possibility of an extremely large wavelength span for multi- wavelength arrays will be discussed. The proposed method will be useful for multi-wavelength VCSEL arrays as well as for the cancellation of wavelength nonuniformity across a wafer.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fumio Koyama, Toshikazu Mukaihara, Yukio Hayashi, Noriyuki Ohnoki, Nobuaki Hatori, and Kenichi Iga "Low-threshold multiwavelength VCSEL arrays fabricated by nonplanar MOCVD", Proc. SPIE 2399, Physics and Simulation of Optoelectronic Devices III, (19 June 1995); https://doi.org/10.1117/12.212535
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KEYWORDS
Vertical cavity surface emitting lasers

Metalorganic chemical vapor deposition

Semiconducting wafers

Fabrication

Optical interconnects

Thermal effects

Wavelength division multiplexing

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