Paper
24 April 1995 Metalorganic chemical vapor deposition (MOCVD) and atomic force microscopy (AFM) study of high-quality Bi-2223 superconducting thin films
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Abstract
Bi-Sr-Ca-Cu-O superconducting films consisting of 2223-high Tc single phase have been prepared on LaAlO3(100) and Nd:YAlO3(001) substrates without post-annealing by MOCVD. As-deposited films exhibited the highest Tc(zero) of 97 K and the highest Jc of 3.8 X 105 Acm-2 at 77 K under zero magnetic field as reported so far. It also showed little degradation of Jc under high magnetic field up to 8 T at 77 K. It was speculated through the measurement of the angular dependence of Jc that the origin of such high Jc is primarily attributed to the intrinsic pinning mechanism. AFM observations of these film surfaces have been carried out to elucidate the crystal growth mechanism and the effect of surface structures on superconducting properties. AFM images of the film surfaces grown on LaAlO3(100) (off angles <EQ 0.3 deg.) and on Nd:YAlO3(001) (off angle approximately 2.7 deg.) clearly showed a 2D nucleation growth and a step flow growth mechanism, respectively. The magnetic-field dependence of Jc and the observed surface morphologies strongly suggest that these as-grown films have no weak-links, which is a promising characteristic for device applications.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuhiro Endo "Metalorganic chemical vapor deposition (MOCVD) and atomic force microscopy (AFM) study of high-quality Bi-2223 superconducting thin films", Proc. SPIE 2397, Optoelectronic Integrated Circuit Materials, Physics, and Devices, (24 April 1995); https://doi.org/10.1117/12.206902
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KEYWORDS
Atomic force microscopy

Metalorganic chemical vapor deposition

Magnetism

Superconductors

Technetium

Thin films

Crystals

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