Focused ion beam (FIB) repair of embedded shifter masks

John C. Morgan; David C. Ferranti; Chris Pennelli; A. Saxonis; William C. Joyce

doi:10.1117/12.195833

7 December 1994 Focused ion beam (FIB) repair of embedded shifter masks

John C. Morgan, David C. Ferranti, Chris Pennelli, A. Saxonis, William C. Joyce

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195833
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

Embedded shifter photomasks have an absorber layer on a quartz substrate. This absorber layer provides the phase shift and also the desired transmission at the lithographic wavelength. Defects consist of missing and extra absorber. Extra absorber defects may be repaired by sputtering away the unwanted material with an ion beam. Missing absorber defects may be repaired by depositing an attenuating material using focused ion beam CVD. It may also be necessary to match the phase shift of the missing absorber by milling into the quartz before depositing. In this paper, we explore the issues involved in making successful focused ion beam repairs of embedded shifter defects. We make several repairs on an embedded shifter mask and analyze the results using a SEM, an UV microdensitometer and an aerial image microscope.

Citation Download Citation

John C. Morgan, David C. Ferranti, Chris Pennelli, A. Saxonis, and William C. Joyce "Focused ion beam (FIB) repair of embedded shifter masks", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195833

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