Photolysis of organically modified gel films and its application to the fine-patterning of oxide thin films

Noboru Tohge; Katsuhide Shinmou; Tsutomu Minami

doi:10.1117/12.188995

13 October 1994 Photolysis of organically modified gel films and its application to the fine-patterning of oxide thin films

Noboru Tohge, Katsuhide Shinmou, Tsutomu Minami

Author Affiliations +

Proceedings Volume 2288, Sol-Gel Optics III; (1994) https://doi.org/10.1117/12.188995
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

The fine-patterning process is very important for the application of sol-gel derived thin films to optical and electronic devices. In the present study, a new technique for the patterning of oxide thin films has been developed. Gel films obtained from metal-alkoxides chemically modified with (beta) -diketones have optical absorption bands in the UV-range characteristic of the (pi) -(pi) * transition in chelate bonds. The irradiation of UV-light corresponding to this transition dissociated the chelate bonds and simultaneously decreased the solubility of the gel films in acidic solutions or alcohols. These findings are indicative of the occurrence of some structural changes in the gel films. The change in solubility of organically modified gel films by the UV-irradiation has been applied to the fine-patterning process; the gel films were irradiated with UV-light and leached in appropriate solutions, followed by the heat-treatment. The present process enables us to make fine-patterns of ZrO₂ and TiO₂ films on a variety of substrates.

Citation Download Citation

Noboru Tohge, Katsuhide Shinmou, and Tsutomu Minami "Photolysis of organically modified gel films and its application to the fine-patterning of oxide thin films", Proc. SPIE 2288, Sol-Gel Optics III, (13 October 1994); https://doi.org/10.1117/12.188995

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