Temperature stability of thin-film narrow bandpass filters produced by ion-assisted deposition

Haruo Takahashi

doi:10.1117/12.192086

4 November 1994 Temperature stability of thin film narrow bandpass filters produced by ion-assisted deposition

Haruo Takahashi

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192086
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

Four types of single-cavity thin-film narrow bandpass filters whose FWHM range from 0.5 to 1.1 nm are produced by ion-assisted deposition of alternating TiO2/SiO2 or Ta2O5/SiO2 layers onto eight substrates having differing coefficients of linear expansion, and the temperature stability of their center wavelengths are examined in the 1540-nm wavelength region. For the eight substrates, whose coefficients of linear expansion range from 0 to 142 X 10^-7/ degree(s)C, the temperature stability of the filters ranges from +0.018 to -0.005 nm/ degree(s)C. Calculations based on a newly developed elastic strain model reveal the main reason temperature stability of the center wavelengths exhibits substrate dependency is due to a reduction in film packing density brought about by volumetric distortion of the film, which is caused by stress induced from the substrate.

Citation Download Citation

Haruo Takahashi "Temperature stability of thin film narrow bandpass filters produced by ion-assisted deposition", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192086

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