Molecular beam deposition of fluorides

Sven Laux; Ute Kaiser; Wolfgang Richter

doi:10.1117/12.192119

4 November 1994 Molecular beam deposition of fluorides

Sven Laux, Ute Kaiser, Wolfgang Richter

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192119
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

A new technique for the fabrication of optical interference layers is being introduced. MgF₂ and NdF₃ have been evaporated by molecular beam deposition (MBD) in an ultrahigh vacuum system. The fluoride films are used in optical interference coatings for optical components of high power excimer lasers. The growth conditions were varied by changing the remaining gas composition, variation of the substrate temperature from 50 degree(s)C to 300 degree(s)C, and interruption of grain growth. The optical losses of the films were measured by transmission spectroscopy and laser calorimetry, and the film morphology was investigated by transmission electron microscopy. It was shown, that a stratification of very thin (1 nm - 10 nm) layers of two different fluorides can avoid the growth of large grains and wide columns, and gives rise to smoother surfaces. The packing density of MBD-films is higher in comparison with fluoride films deposited under conventional high vacuum conditions.

Citation Download Citation

Sven Laux, Ute Kaiser, and Wolfgang Richter "Molecular beam deposition of fluorides", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192119

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