Application of ion-assisted-deposition using a gridless end-Hall ion source for volume manufacturing of thin film optical filters

Michael L. Fulton

doi:10.1117/12.192111

4 November 1994 Application of ion-assisted deposition using a gridless end-Hall ion source for volume manufacturing of thin film optical filters

Michael L. Fulton

Author Affiliations +

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192111
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

A wide variety of thin-film materials (TiO₂, SiO₂, Al₂O₃, HfO₂, Ta₂O₅, ITO, Y₂O₃, CeO₂, Si₃N₄, ZrO₂, Au, Ag, and MgF₂) were deposited using conventional electron beam and thermal evaporation techniques with a concomitant bombardment of energetic oxygen ions from a gridless end-Hall ion source. The oxygen-ion-assisted deposition was performed with an ion-beam current of approximately one Ampere over a range of 40 to 120 eV, providing a uniform ion current density (.3 to .5 mA/cm²) impinging on a large substrate area (5024 cm²). Compared to film deposited using standard gridded ion sources this process produces optically equivalent materials with a broad ion beam which is well suited for volume manufacturing.

Citation Download Citation

Michael L. Fulton "Application of ion-assisted deposition using a gridless end-Hall ion source for volume manufacturing of thin film optical filters", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192111

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