Surface processing by high-power soft x-ray irradiation

Valery Ju. Znamenskiy; O. B. Anan'in; J. Bykovsky; Ju. V. Eremin; I. K. Novikov; A. A. Zhuravlev

doi:10.1117/12.184708

7 September 1994 Surface processing by high-power soft x-ray irradiation

Valery Ju. Znamenskiy, O. B. Anan'in, J. Bykovsky, Ju. V. Eremin, I. K. Novikov, A. A. Zhuravlev

Proceedings Volume 2207, Laser Materials Processing: Industrial and Microelectronics Applications; (1994) https://doi.org/10.1117/12.184708
Event: Europto High Power Lasers and Laser Applications V, 1994, Vienna, Austria

Abstract

The principle of high power soft X-ray source design using laser plasma and waveguide X-ray optics is described. The radiation parameters of pulse and high-repetitive sources are reported. The experiments on X-ray induced effect on crystalline heteroepitaxial ZnSe/GaAs films are described.

Citation Download Citation

Valery Ju. Znamenskiy, O. B. Anan'in, J. Bykovsky, Ju. V. Eremin, I. K. Novikov, and A. A. Zhuravlev "Surface processing by high-power soft x-ray irradiation", Proc. SPIE 2207, Laser Materials Processing: Industrial and Microelectronics Applications, (7 September 1994); https://doi.org/10.1117/12.184708

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