Paper
17 May 1994 Simulations on step-and-scan optical lithography
Joerg Bischoff, Wolfgang Henke, Jan van der Werf, Peter Dirksen
Author Affiliations +
Abstract
Step and scan projection printers overcome the most stringent restriction of step and repeat cameras: the trade off between the resolving power of the lithographic lens and its image field. In a scanning projection printer the reticle and wafer both have to be moved with a constant velocity, keeping their speed ratio equal to the reduction of the lens. The length of the circuit is now reticle limited. An additional extension consists in stitching several lanes together in order to lengthen the dimension perpendicular to the scan direction. However, lens aberrations, mechanical vibrations as well as synchronization errors of the stages, deteriorate the image transfer. The aim of this article is the classification and treatment of these scan- induced deteriorations. So-called contrast transfer curves are calculated offering the possibility of gaining quantitative values of the disturbance amplitudes for permissible contrast drops. Additionally, exposure-defocus (ED) trees are constructed as an evaluation criterion of the scan-induced image degradation.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joerg Bischoff, Wolfgang Henke, Jan van der Werf, and Peter Dirksen "Simulations on step-and-scan optical lithography", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175488
Lens.org Logo
CITATIONS
Cited by 5 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reticles

Semiconducting wafers

Monochromatic aberrations

Printing

Convolution

Optical lithography

Contrast transfer function

RELATED CONTENT

MEEF in theory and practice
Proceedings of SPIE (December 30 1999)
Optical lithography: 40 years and holding
Proceedings of SPIE (March 27 2007)
Business dynamics of lithography at very low k1 factors
Proceedings of SPIE (July 26 1999)
Use Of A Single Size Square Serif For Variable Print...
Proceedings of SPIE (July 25 1989)
Astigmatism and field curvature from pin-bars
Proceedings of SPIE (July 01 1991)

Back to Top