Through quartz metrology in an automated chemical process

Alex R. Naderi

doi:10.1117/12.167253

15 February 1994 Through quartz metrology in an automated chemical process

Alex R. Naderi

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167253
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

This paper introduces the theory of operation for `through-quartz' metrology as it applies to endpoint detection in an automated chemical processor, the Siscan IMPACT 7000. Further, a statistical analysis of actual manufacturing results will be presented with a focus on improvements in manufacturing process capability over standard manufacturing techniques as well as improved reticle performance in the wafer lithographers' environment through tighter image fidelity to design rules.

Citation Download Citation

Alex R. Naderi "Through quartz metrology in an automated chemical process", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167253

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