Paper
12 November 1993 Quantitative analysis of the effects of heat loading on an undulator beamline
Friedmar Senf, U. Menthel, William B. Peatman
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Abstract
With the help of several computer codes especially developed or adapted for this application, the energy losses in the individual components of a high resolution undulator beamline for BESSY II were quantitatively calculated and their affect on the performance of the beamline determined. The critical portion of the beamline, a Kirkpatrick-Baez system in front of the entrance slit, can be designed so as to withstand the deleterious effects of the heat loading with essentially no loss of intrinsic brightness of the source. The absorbed heat load profile has been determined in a dense grid on the mirror surfaces by taking the variation of the spectral power distribution from the undulator and the reflectivity of the surfaces into account. The influence of the angle of incidence on the first horizontally deflecting mirror as well as of a vertical aperture in front of the beamline has also been studied.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Friedmar Senf, U. Menthel, and William B. Peatman "Quantitative analysis of the effects of heat loading on an undulator beamline", Proc. SPIE 1997, High Heat Flux Engineering II, (12 November 1993); https://doi.org/10.1117/12.163805
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Cited by 1 scholarly publication.
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KEYWORDS
Mirrors

Grazing incidence

Heat flux

Thermal engineering

Optical components

Reflectivity

Thermal effects

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