Base-catalyzed photosensitive polyimide

Dennis R. McKean; Gregory M. Wallraff; Willi Volksen; Nigel P. Hacker; Martha I. Sanchez; Jeff W. Labadie

doi:10.1117/12.154807

15 September 1993 Base-catalyzed photosensitive polyimide

Dennis R. McKean, Gregory M. Wallraff, Willi Volksen, Nigel P. Hacker, Martha I. Sanchez, Jeff W. Labadie

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154807
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A scheme for imaging of polyimide films is described which is based on the amine-catalyzed imidization of poly(amic alkyl ester) precursor polymers. Films containing amine photogenerators along with poly(amic alkyl esters) are patterned by exposure followed by heating to partially imidize the exposed portion of the film. Negative images are developed by taking advantage of the greater solubility of the precursor polymer which is dissolved in an appropriate solvent mixture. A final cure is carried out to complete the imidization of the patterned film.

Citation Download Citation

Dennis R. McKean, Gregory M. Wallraff, Willi Volksen, Nigel P. Hacker, Martha I. Sanchez, and Jeff W. Labadie "Base-catalyzed photosensitive polyimide", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154807

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