Paper
4 May 1993 Output characteristics of ultrahigh repetition rate and high-power XeCl excimer laser
Tatsumi Goto, S. Takagi, Naomichi Okamoto, K. Kakizaki, Saburoh Satoh
Author Affiliations +
Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144668
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece
Abstract
A high repetition rate excimer laser has been developed. The laser gas can be circulated at a flow rate of 120 m/s uniformly in the discharge region by a 4-stage axial blower. The recent results are presented on the XeCl laser operated stably at an ultra-high repetition rate of 4 kHz and an average power of 200 W in the condition of CR equals 3 with thinner He buffer gas mixtures. Above this repetition rate, the laser power saturates caused by the discharge constrictions. The residual charged particles probably induce this localized discharge instability, and Xe content has a harmful influence dominantly on the output power.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsumi Goto, S. Takagi, Naomichi Okamoto, K. Kakizaki, and Saburoh Satoh "Output characteristics of ultrahigh repetition rate and high-power XeCl excimer laser", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); https://doi.org/10.1117/12.144668
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KEYWORDS
Gas lasers

Excimer lasers

Xenon

Ions

Laser development

Chemical lasers

High power lasers

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