Positive-tone surface imaging: methodologies for analysis and process control

Susan K. Jones; Peter Freeman; Edward K. Pavelchek; John F. Bohland; Bruce W. Dudley; Gary S. Calabrese

doi:10.1117/12.59843

1 June 1992 Positive-tone surface imaging: methodologies for analysis and process control

Susan K. Jones, Peter Freeman, Edward K. Pavelchek, John F. Bohland, Bruce W. Dudley, Gary S. Calabrese

Proceedings Volume 1673, Integrated Circuit Metrology, Inspection, and Process Control VI; (1992) https://doi.org/10.1117/12.59843
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A variety of analytical and process control techniques have been employed during process development activities for a 0.5 micrometers deep UV positive tone surface imaging process. Examples of applications of these methods for identification of primary positive tone surface imaging issues and process optimization for enhancement of ultimate resolution are described. Advantages and limitations for each technique are discussed.

Citation Download Citation

Susan K. Jones, Peter Freeman, Edward K. Pavelchek, John F. Bohland, Bruce W. Dudley, and Gary S. Calabrese "Positive-tone surface imaging: methodologies for analysis and process control", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59843

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