Percolation view of novolak dissolution and dissolution inhibition

Tung-Feng Yeh; Hsiao-Yi Shih; Arnost Reiser

doi:10.1117/12.59731

1 June 1992 Percolation view of novolak dissolution and dissolution inhibition

Tung-Feng Yeh, Hsiao-Yi Shih, Arnost Reiser

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59731
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The dissolution of novolak and other phenolic resins in aqueous alkali is controlled by the diffusion of developer base in the solid matrix. The base penetrates the resin by a series of transfers or jumps from one hydrophilic (phenol/phenolate) site to the next and requires an unbroken sequence of sites in the diffusional pathway. This view brings novolak dissolution into the realm of percolation theory, which predicts for it a scaling law of the form: R equals constant (p - pc)n. R is the dissolution rate, the percolation parameter p measures the fraction of occupied percolation cells, and pc is a percolation threshold. The scaling law of percolative dissolution was tested and confirmed on a group of partially methylated poly(vinylphenol) resins. Inhibitors affect the percolation process by blocking some of the hydrophilic sites and effectively removing them from the percolation field. This is equivalent to lowering the value of p and leads to a decrease in the dissolution rate. Theory predicts a relation between the inhibition effect and the derivative dlogR/dp, and that too has been confirmed by experiment. The percolation model thus provides a consistent and unified interpretation of the functional mechanism of positive resists based on dissolution inhibition.

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Tung-Feng Yeh, Hsiao-Yi Shih, and Arnost Reiser "Percolation view of novolak dissolution and dissolution inhibition", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59731

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