Effect of stitching errors on the performance of DFB lasers fabricated using e-beam lithography (Poster Paper)

Torgil Kjellberg; Richard Schatz; Stefan Nilsson; Bjoern Broberg

doi:10.1117/12.136022

9 July 1992 Effect of stitching errors on the performance of DFB lasers fabricated using e-beam lithography (Poster Paper)

Torgil Kjellberg, Richard Schatz, Stefan Nilsson, Bjoern Broberg

Author Affiliations +

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136022
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A comprehensive investigation on field stitching errors and their effect on the single-mode characteristics of DFB lasers fabricated using e-beam lithography is presented. The stitching errors are associated with small-area, high-resolution electron beam exposure, which has the potential advantage of high-speed writing of laser gratings. Measurements show that the errors are composed of a systematic and a stochastic part. Their effect on the grain margin was simulated both for (lambda) /4 phase-shifted and optimized multiple-phase-shifted DFB lasers. Simulations show that the lasers are insensitive to the systematic part of the stitching errors if the number of errors is large enough. The stochastic part was found to give rise to a variation in gain margin of the DFB lasers. We have concluded that the field stitching accuracy in the high-resolution mode of a commercial system for electron beam lithography is sufficient to provide a high yield of single-mode lasers. However, it is essential that certain precautions are taken considering exposure conditions, and that a fault tolerant laser design is used. Devices with side-mode suppression ratios of up to 48 dB have been fabricated, confirming that small-area, high-resolution e-beam lithography is appropriate in the production of high-quality single-mode DFB lasers.

Citation Download Citation

Torgil Kjellberg, Richard Schatz, Stefan Nilsson, and Bjoern Broberg "Effect of stitching errors on the performance of DFB lasers fabricated using e-beam lithography (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136022

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Semiconducting wafers

Stochastic processes

Electron beam lithography

Phase shifts

Optical simulations

Computer simulations

Hole burning spectroscopy

Show All Keywords

Keywords/Phrases

Search In:

Publication Years