Chromatic and spherical aberration correction in axially symmetric electrostatic lenses

Ivan L. Berry

doi:10.1117/12.136034

9 July 1992 Chromatic and spherical aberration correction in axially symmetric electrostatic lenses

Ivan L. Berry

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136034
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

High performance focused ion beam systems utilizing liquid metal ion sources are performance limited due to the chromatic aberration of the optical elements and the finite energy spread of the ion source. Some concepts are presented to reduce the chromatic and spherical aberrations utilizing axially symmetric electrostatic optical elements. Unlike paraxial optics, in off-axis optics the individual aberrations of each lens element interact. This allows the total system aberrations to be minimized by optimizing lens parameters. Fifth order raytracing is used to determine the off-axis aberrations of a two lens system. The aberrations are then calculated as a function of the inter-lens spacing and are shown to have distinct minima. By optimizing the lens acceptance angle and the lens spacing off-axis chromatic aberration and the geometric aberrations (including spherical aberration) may be reduced to values below that achievable using paraxial optics at the same beam current. Novel coaxial optical lens designs are presented which also offers the possibility of chromatic aberration correction and may provide improved performance over conventional optics for special applications.

Citation Download Citation

Ivan L. Berry "Chromatic and spherical aberration correction in axially symmetric electrostatic lenses", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136034

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