Paper
29 July 1992 Fabrication of optical surfaces with low subsurface damage using a float polishing process
David W. Reicher, C. F. Kranenberg, R. S. Stowell, Kenneth C. Jungling, John Robert McNeil
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Abstract
The attempt to eliminate subsurface damage in polished materials is a major objective in optical and semiconductor fabrication. The level of subsurface damage in optical components is proportional to the surface scatter and related to the laser damage threshold of the optic. The float polishing process has been shown to produce surfaces with low subsurface damage on ferrite materials. We have ground samples of rough cut Corning 7940 fused silica using synthetic polycrystalline diamond. These samples were then float polished on a precision machine manufactured by Toyoda Machine Works Limited. Our surfaces were characterized using differential phase interference microscopy, total internal reflection microscopy, and scatterometry. We will describe the fabrication process and report the results of the surface and subsurface characterization.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David W. Reicher, C. F. Kranenberg, R. S. Stowell, Kenneth C. Jungling, and John Robert McNeil "Fabrication of optical surfaces with low subsurface damage using a float polishing process", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60103
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Cited by 2 scholarly publications.
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KEYWORDS
Polishing

Surface finishing

Silica

Laser induced damage

Microscopes

Diamond

Microscopy

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