Paper
17 November 1978 Chemical Vapor Deposited Molybdenum Films For Use In Photothermal Conversion'
G. E. Carver, D. D. Allred, B. O. Seraphin
Author Affiliations +
Abstract
High infrared reflectance, coupled with high solar absorptance, is required for efficient photothermal conversion. Converters can be fabricated by depositing an absorber on a highly reflecting metal. The absorber functions in the visible, yet becomes transparent in the near infrared, allowing the metal to suppress the thermal emittance. Economic considerations demand the use of thin films, rather than bulk materials. The thin film reflector must be capable of withstanding high temperatures of operation. Compatibility of the re-flector with the substrate below, and the absorber above, is required for long-time service. Highly reflective silver films suffer reflectance losses by agglomeration, and require stabilization layers. Refractory materials such as molybdenum avoid agglomeration at temperatures of operation of photothermal converters. Unlike other deposition methods, chemical vapor deposition (CVD) can produce molybdenum films with an infrared reflectance rivaling that of bulk molybdenum. CVD is a non-vacuum based technology with potential for sequential throughput fabrication. Studies are being undertaken to determine how sensitively the reflectance reacts to inclusions of impurities into the molybdenum. Thin film passivators deposited on the molybdenum prevent reflectance losses induced by oxidation, and insure high temperature survival of optimal reflectance. Complete converter stacks have been annealed at 550°C for over 1000 hours in air.
© (1978) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. E. Carver, D. D. Allred, and B. O. Seraphin "Chemical Vapor Deposited Molybdenum Films For Use In Photothermal Conversion'", Proc. SPIE 0161, Optics Applied to Solar Energy IV, (17 November 1978); https://doi.org/10.1117/12.956873
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Cited by 1 scholarly publication and 3 patents.
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KEYWORDS
Molybdenum

Reflectivity

Chemical vapor deposition

Thin films

Infrared radiation

Oxygen

Silicon

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