Paper
1 December 1991 Interference effect on laser trimming and layer thickness optimization
Author Affiliations +
Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51029
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
Due to imprecisions in the deposition process, linear semiconductors require post-production circuit adjustment. Lasers are used to adjust (or trim) thin film resistors to precise electrical performance specifications. The effect of coherent laser beam interference in multilayer structure on thin film resistor trimming has been well documented. As the layer structure becomes more and more complex, the difficulty in determining the interference effect on the trimming results becomes greater. To assist the circuit designer and laser trimmer user, a simplified multilayer thin-film resistor interference model and a universal software program have been developed. Several verifications have been made of customer designs using the model and software programs. While the model gives the user a clear picture of the physics of the interference effect, the software provides a precise recommendation for layer structuring that results in maximum laser absorption into the resistor.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yunlong Sun "Interference effect on laser trimming and layer thickness optimization", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); https://doi.org/10.1117/12.51029
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Cited by 4 scholarly publications.
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KEYWORDS
Resistors

Thin films

Laser energy

Interfaces

Computer simulations

Multilayers

Reflectivity

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