Advances in interferometric wavefront-measuring technology through the direct measuring interferometry method

Michael F. Kuechel

doi:10.1117/12.57757

1 April 1992 Advances in interferometric wavefront-measuring technology through the direct measuring interferometry method

Michael F. Kuechel

Author Affiliations +

Proceedings Volume 1573, Commercial Applications of Precision Manufacturing at the Sub-Micron Level; (1992) https://doi.org/10.1117/12.57757
Event: SIRA, 1991, London, United Kingdom

Abstract

With the invention of a new phase measuring technique, 'Direct Measuring Interferometry' (DMI), almost all practical difficulties of quantitative interferometry in production environment are solved to a large extent.

Citation Download Citation

Michael F. Kuechel "Advances in interferometric wavefront-measuring technology through the direct measuring interferometry method", Proc. SPIE 1573, Commercial Applications of Precision Manufacturing at the Sub-Micron Level, (1 April 1992); https://doi.org/10.1117/12.57757

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