Paper
1 December 1991 Pressure effects in the microwave plasma growth of polycrystalline diamond
Alan B. Harker, Jeffrey F. DeNatale
Author Affiliations +
Abstract
Microwave plasma deposition of polycrystalline diamond is investigated over the pressure range 1 to 100 kPa. The conditions of growth, microstructure, and spectroscopic properties of the resulting materials are compared. A phenomenological description of the dependence of diamond microstructure upon growth conditions is developed.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan B. Harker and Jeffrey F. DeNatale "Pressure effects in the microwave plasma growth of polycrystalline diamond", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); https://doi.org/10.1117/12.48274
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Plasma

Diamond

Microwave radiation

Particles

Etching

Hydrogen

Carbon

RELATED CONTENT

Plasma-Enhanced Processing Of Diamond Films
Proceedings of SPIE (March 15 1989)
Diamond Synthesis By DC Plasma Jet CVD
Proceedings of SPIE (January 15 1989)
Mass spectrometry studies of diamond deposition
Proceedings of SPIE (November 20 1992)

Back to Top