Electron-beam metrology: the European initiative

James J. Jackman

doi:10.1117/12.44425

1 July 1991 Electron-beam metrology: the European initiative

James J. Jackman

Proceedings Volume 1464, Integrated Circuit Metrology, Inspection, and Process Control V; (1991) https://doi.org/10.1117/12.44425
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Progress is reported on development of a joint European electron beam based CD metrology instrument for sub-0.5-micrometers lines. The current work is funded as a project within the European Strategic Programme for Research and Development in Information Technology (ESPRIT), a department within the European Economic Community (EEC) and is being undertaken by a consortium of two equipment manufacturers, three IC manufacturers or users, and four research institutes. The project has been running for a period of 15 months, and this time has been used to undertake R&D of the most critical and high risk elements. The following major elements are covered: (1) Defining the user needs, including the operating environment. This has resulted in the specification of an 8' cassette-cassette, 20 wph instrument capable of both measurement and inspection in a hostile environment vis-a-vis stray fields, acoustic and floor vibrations. (2) Using advanced Monte-Carlo techniques and finite field analysis, modelling of the total image forming chain for low energy electrons. (3) Development of new measurement algorithms based on the information from (2). (4) Development of various hardware elements. The task of integrating the above elements into a full prototype including a wafer handling system control and user qualification will take place in the second half of the project which has received additional funding support from the Joint European Submicron Silicon Initiative (JESSI).

Citation Download Citation

James J. Jackman "Electron-beam metrology: the European initiative", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44425

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