Cross-sectional imaging in SEM: signal formation mechanism and CD measurements

Leon A. Firstein; Arthur Noz

doi:10.1117/12.44426

1 July 1991 Cross-sectional imaging in SEM: signal formation mechanism and CD measurements

Leon A. Firstein, Arthur Noz

Proceedings Volume 1464, Integrated Circuit Metrology, Inspection, and Process Control V; (1991) https://doi.org/10.1117/12.44426
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

SEM cross-sectional (CS) imaging widely practiced in CD measurements of sub- micron (down to .10 micrometers ) features will be reviewed with emphasis on the accuracy with which these measurements represent the actual dimensions. Since the CS imaging mode is commonly employed to establish a correct CD linescan measuring algorithm, the magnitude of systematic error associated with CS imaging at specific SEM settings will be addressed. The image formation mechanism developed by K.-R. Peters was invoked in the investigation of the electron-scattering signal generated by topographic contrast in CS imaging. The main result of this study--the systematic error in the CS imaging mode, at the same experimental conditions, is larger than that in the normal incidence linescan mode--has been found to markedly contradict the commonly accepted metro logical assumption applied to CS CD measurements. Theoretical and experimental results supporting this conclusion will be presented and discussed.

Citation Download Citation

Leon A. Firstein and Arthur Noz "Cross-sectional imaging in SEM: signal formation mechanism and CD measurements", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44426

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