Advanced confocal technique for submicron CD measurements

Axel Rohde; Ralf Saffert; John Fitch

doi:10.1117/12.44456

1 July 1991 Advanced confocal technique for submicron CD measurements

Axel Rohde, Ralf Saffert, John Fitch

Proceedings Volume 1464, Integrated Circuit Metrology, Inspection, and Process Control V; (1991) https://doi.org/10.1117/12.44456
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A new CD measuring tool based on confocal scanning technology, Carl Zeiss Axioscan, is described. The advantages of having a great variability in choosing the illumination is demonstrated with several examples. Selection of deep UV illumination increases the lateral and height resolution of the system. Matching the illumination to the optical constants of the materials to be measured enhances the reproducibility and the accuracy of the measurement. In the description of the system, it is shown how the confocal scanning technique can be implemented with conventional light sources, and how this increases the flexibility in illumination conditions.

Citation Download Citation

Axel Rohde, Ralf Saffert, and John Fitch "Advanced confocal technique for submicron CD measurements", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44456

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