Thermo-activated photoetching of PMMA in direct writing by laser beam

S. F. Maslenitsyn; V. B. Svetovoy

doi:10.1117/12.48181

1 December 1991 Thermo-activated photoetching of PMMA in direct writing by laser beam

S. F. Maslenitsyn, V. B. Svetovoy

Proceedings Volume 1440, Optical Radiation Interaction with Matter; (1991) https://doi.org/10.1117/12.48181
Event: Optical Radiation Interaction with Matter, 1990, Leningrad, Russian Federation

Abstract

The discovery of polymer ablative etching by far-ultraviolet (UV) excimer laser pulses has given rise to a wave of publications devoted to the investigation of the etching mechanism and applications of this phenomenon. Against this background, the studies in which the action of continuous UV-light on polymers is examined are less noticeable. They include the direct photoetching under UV-lamp irradiation and the direct writing by a cw laser beam on a polymethylmetacrylate (PMMA) film and some other polymeric materials. One can expect that laser writing on the polymer film will find its application in local area processing and custom patterning. The purpose of this work is to estimate the direct writing abilities for simultaneous photochemical and thermal action of a laser beam on PMMA.

Citation Download Citation

S. F. Maslenitsyn and V. B. Svetovoy "Thermo-activated photoetching of PMMA in direct writing by laser beam", Proc. SPIE 1440, Optical Radiation Interaction with Matter, (1 December 1991); https://doi.org/10.1117/12.48181

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