Interferometric measurement of in-plane motion

Michael Hercher; Geert J. Wijntjes

doi:10.1117/12.51111

1 January 1991 Interferometric measurement of in-plane motion

Michael Hercher, Geert J. Wijntjes

Proceedings Volume 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection; (1991) https://doi.org/10.1117/12.51111
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

Interferometric metrology in which transverse or in-plane measurements are made is discussed. This technique can measure the displacements of diffusely scattering surfaces with microinch resolution and accuracies on the order of 0.01 percent and the displacements of relatively coarse scales with submicroinch precision and an accuracy determined by the scale itself at speeds over 100 ft/sec. The measurement principle and geometry are described and the measurement of the interferometric phase is addressed. The system design is presented.

Citation Download Citation

Michael Hercher and Geert J. Wijntjes "Interferometric measurement of in-plane motion", Proc. SPIE 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection, (1 January 1991); https://doi.org/10.1117/12.51111

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