Source emission pattern polynomial representation

Ricardo Flores-Hernandez; Francisco De Villa

doi:10.1117/12.22415

1 December 1990 Source emission-pattern polynomial representation

Ricardo Flores-Hernandez, Francisco De Villa

Proceedings Volume 1324, Modeling of Optical Thin Films II; (1990) https://doi.org/10.1117/12.22415
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A method to obtain accurate thickness data to characterize the emission patterns of evaporation sources is described. Thickness data is obtained through digital image processing algorithms applied to the monochromatic transmission bands digitized from a set of multilayer Fabry-Perot filters deposited on large flat circular substrates. These computer image-processed taper-thickness patterns are reduced to orthonormal polynomial series expansions in two steps, using Tschebyshev and associated Legendre polynomials. The circular glass substrates employed to characterize each type of evaporation source are kept stationary during the evaporation process of evaporation of each layer to obtain the specific thickness distribution for each type of source.

Citation Download Citation

Ricardo Flores-Hernandez and Francisco De Villa "Source emission-pattern polynomial representation", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); https://doi.org/10.1117/12.22415

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