Multiphysics workflow for modeling stress birefringence

João Mendes-Lopes; Stefano Guazzotti; Michael Cheng; Matthias Schlich; Chris Normanshire; Esteban F. Carbajal

doi:10.1117/12.3029374

2 October 2024 Multiphysics workflow for modeling stress birefringence

João Mendes-Lopes, Stefano Guazzotti, Michael Cheng, Matthias Schlich, Chris Normanshire, Esteban F. Carbajal

Proceedings Volume 13129, Optical Modeling and Performance Predictions XIV; 1312907 (2024) https://doi.org/10.1117/12.3029374
Event: Optical Engineering + Applications, 2024, San Diego, California, United States

Abstract

Design decisions for today’s complex systems require insights that are traditionally obtained from make and break testing when critical design decisions need to be made. With ever-increasing complexity, a more streamlined workflow that involves multiphysics simulation is essential. This transition is exemplified in polarization-dependent optical systems that are becoming prevalent in AR/VR where stress birefringence can negatively affect the performance of the optical design. To quantify this effect, we have developed a method that utilizes non-uniform stress data from finite element analysis in conjunction with non-uniform gradient index ray tracing to calculate the polarization and wavefront error as part of a wholistic multiphysics simulation analysis. Practical examples will be used to demonstrate the workflow and to analysis the impact of stress birefringence.

Conference Presentation

Citation Download Citation

João Mendes-Lopes, Stefano Guazzotti, Michael Cheng, Matthias Schlich, Chris Normanshire, and Esteban F. Carbajal "Multiphysics workflow for modeling stress birefringence", Proc. SPIE 13129, Optical Modeling and Performance Predictions XIV, 1312907 (2 October 2024); https://doi.org/10.1117/12.3029374

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