Methodology for robust process window discovery in plasmonic nanostructures

Muthiah Annamalai; Somilkumar J. Rathi

doi:10.1117/12.3027327

2 October 2024 Methodology for robust process window discovery in plasmonic nanostructures

Muthiah Annamalai, Somilkumar J. Rathi

Author Affiliations +

Proceedings Volume 13111, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XXII; 131110A (2024) https://doi.org/10.1117/12.3027327
Event: Nanoscience + Engineering, 2024, San Diego, California, United States

Conference Poster

Abstract

We explore improved Plasmonic nanostructure fabrication using process and experiment design methodologies using a DOE and process tracking tool PanMo-Confab. This methodology is shown to yield a robust process window in case of plasmonic nanostructure fabrication and a faster time to optimal design and response variable tuning.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Muthiah Annamalai and Somilkumar J. Rathi "Methodology for robust process window discovery in plasmonic nanostructures", Proc. SPIE 13111, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XXII, 131110A (2 October 2024); https://doi.org/10.1117/12.3027327

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