Paper
1 October 1990 Characteristics and applications of advanced technology microchannel plates
Jerry R. Horton, G. William Tasker, John J. Fijol
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Abstract
A method for fabrication of novel thin-filrn continuous dynode electron multipliers is described. We have shown the feasibility of crucial manufacturing steps, including anisotropic dry etching of substrates into photolithographically-defined arrays of high-aspect-ratio channels, and the formation of thin-film continuous dynodes by chemical vapor deposition. We discuss potential performance and design advantages of this advanced technology microchannel plate (AT-MCP) over the conven tional reduced lead silicate glass inicrochannel plate (RLSG-'MCP) and implications for new applications.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerry R. Horton, G. William Tasker, and John J. Fijol "Characteristics and applications of advanced technology microchannel plates", Proc. SPIE 1306, Sensor Fusion III, (1 October 1990); https://doi.org/10.1117/12.21634
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Microchannel plates

Glasses

Semiconducting wafers

Silicon

Thin films

Sensor fusion

Low pressure chemical vapor deposition

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