Aligned 2-photon lithography for photonic applications

Mareike D. Trappen; Matthias Blaicher; Tobias Hoose; Nicole Lindenmann; Stephan Dottermusch; Andrea Bertoncini; Philipp Rayling; Kai Sandfort; Roman Rainer; Fabian B. Niesler; Michael Thiel; Mana Taghdiri

doi:10.1117/12.3023930

18 June 2024 Aligned 2-photon lithography for photonic applications

Mareike D. Trappen, Matthias Blaicher, Tobias Hoose, Nicole Lindenmann, Stephan Dottermusch, Andrea Bertoncini, Philipp Rayling, Kai Sandfort, Roman Rainer, Fabian B. Niesler, Michael Thiel, Mana Taghdiri

Author Affiliations +

Proceedings Volume 13024, Optical Instrument Science, Technology, and Applications III; 130240A (2024) https://doi.org/10.1117/12.3023930
Event: SPIE Optical Systems Design, 2024, Strasbourg, France

Abstract

We employ aligned two-photon lithography (A2PL®), to push high precision alignment tasks from the photonic packaging step towards the fabrication process in a one step process. Combined with Two-Photon Grayscale Lithography (2GL®), this approach enables direct fabrication of micro-optical elements onto devices, enhancing functionality with highest surface quality and shape fidelity at high throughput. We demonstrate automated 3D alignment using customer-ready detection algorithms, to fabricate micro-optical elements attached to various topographies and material platforms with exceptional accuracy below 100 nm. We showcase micro-optical elements aligned to fiber tips, photonic edge couplers, and photonic grating couplers to demonstrate the validity of A2PL for improved coupling losses and beam quality.

Conference Presentation

Citation Download Citation

Mareike D. Trappen, Matthias Blaicher, Tobias Hoose, Nicole Lindenmann, Stephan Dottermusch, Andrea Bertoncini, Philipp Rayling, Kai Sandfort, Roman Rainer, Fabian B. Niesler, Michael Thiel, and Mana Taghdiri "Aligned 2-photon lithography for photonic applications", Proc. SPIE 13024, Optical Instrument Science, Technology, and Applications III, 130240A (18 June 2024); https://doi.org/10.1117/12.3023930

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