Sensitivity-enhancing modified photopolymer of PQ/PMMA

Junhui Wu; Junchao Jin; Jinhong Li; Zeyi Zeng; Jie Liu; Qingdong Li; Mingyong Chen; Zuoyu Zhang; Li Wang; Xiao Lin; Xiaodi Tan

doi:10.1117/12.3015541

18 June 2024 Sensitivity-enhancing modified photopolymer of PQ/PMMA

Junhui Wu, Junchao Jin, Jinhong Li, Zeyi Zeng, Jie Liu, Qingdong Li, Mingyong Chen, Zuoyu Zhang, Li Wang, Xiao Lin, Xiaodi Tan

Author Affiliations +

Proceedings Volume 13015, Photosensitive Materials and their Applications III; 1301508 (2024) https://doi.org/10.1117/12.3015541
Event: SPIE Photonics Europe, 2024, Strasbourg, France

Abstract

Photopolymers are special polymeric materials that can be irradiated with light to form polymer structures. It is widely used in the fields of 3D printing, anti-counterfeiting and information storage. In today's relatively mature holographic storage technology, high-density volume holographic data storage requires storage materials with a high response rate, high effective storage density and optical transparency, and high signal-to-noise ratio, etc. For this reason, storage materials have been studied in various fields. Phenanthrenequinone (PQ)/poly(methyl methacrylate) (PMMA) materials are a choice for holographic storage. By modifying the polymer substrate of the lamellar PQ/PMMA holographic polymeric material, it is possible to reduce the generation of bubbles during the preparation of the material to increase the usable area of the material, and at the same time, it is also possible to improve the photoreceptor sensitivity to a certain extent, to increase the read/write speed of the material and to analyze the causes of the phenomenon using the first nature principle calculations.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Junhui Wu, Junchao Jin, Jinhong Li, Zeyi Zeng, Jie Liu, Qingdong Li, Mingyong Chen, Zuoyu Zhang, Li Wang, Xiao Lin, and Xiaodi Tan "Sensitivity-enhancing modified photopolymer of PQ/PMMA", Proc. SPIE 13015, Photosensitive Materials and their Applications III, 1301508 (18 June 2024); https://doi.org/10.1117/12.3015541

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