High numerical aperture ZrO2 holographic metasurfaces for imaging and optical trapping applications in the visible range

Mohammad Biabanifard; Tomasz Plaskocinski; Jianling Xiao; Andrea Di Falco

doi:10.1117/12.3017158

10 June 2024 High numerical aperture ZrO₂ holographic metasurfaces for imaging and optical trapping applications in the visible range

Mohammad Biabanifard, Tomasz Plaskocinski, Jianling Xiao, Andrea Di Falco

Author Affiliations +

Proceedings Volume 12990, Metamaterials XIV; 129900N (2024) https://doi.org/10.1117/12.3017158
Event: SPIE Photonics Europe, 2024, Strasbourg, France

Conference Poster

Abstract

On-chip optical trapping as an alternative to bulky microscope objectives has been primarily explored in the near-infrared spectrum with the aid of metalenses. This limitation arises from the tendency of dielectric metasurfaces to be constrained to the infrared transparency window, resulting in significant absorption losses, especially in the visible spectrum and particularly at shorter wavelengths. However, optical trapping in shorter wavelengths can provide higher trap stiffness that can stabilize the trapping platform. Silicon and titanium dioxide as common materials that can be utilized for optical trapping in the visible range pose practical limitations due to either the nature of the material or the fabrication process involved. Here, we introduce zirconium dioxide as a reliable alternative to other material platforms, having a high refractive index with weakly-dispersive behavior in the ultraviolet and visible range with negligible absorption loss, along with excellent mechanical strength. We experimentally report the first demonstration of on-chip devices for optical trapping below 500 nm and holographic image projection applications across the entire visible range. Specifically, we created metasurfaces for optical trapping applications with a high numerical aperture (NA=1.2) at wavelengths as low as 532 nm and 488 nm, with trap stiffness greater than 130 pN/(μmW) and 200 pN/(μmW), respectively. Importantly, the efficient developed fabrication scheme consists of two steps, including E-beam lithography and atomic layer deposition with operational temperature as low as 80°C. This fabrication scheme encapsulates the meta-atoms and offers a flat biocompatible layer atop the structure.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Mohammad Biabanifard, Tomasz Plaskocinski, Jianling Xiao, and Andrea Di Falco "High numerical aperture ZrO₂ holographic metasurfaces for imaging and optical trapping applications in the visible range", Proc. SPIE 12990, Metamaterials XIV, 129900N (10 June 2024); https://doi.org/10.1117/12.3017158

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